OCI Materials Co., Ltd. is a Korea-based company engaged in the manufacture of special gas used in semiconductor, liquid crystal display (LCD) and solar cell manufacturing processes. The Company mainly produces nitrogen trifluoride (NF3), which is injected to remove any residues on the internal walls of chemical vapor deposition (CVD) chamber; silane (SiH4), which is used to deposit silicon on wafer in semiconductors and to deposit silicon on TFT on top of glass substrates for TFT-LCD; tungsten hexafluoride (WF6), which makes contact plugs during CVD process, as well as dichlorosilane (DCS), which is silicon precursor gas used in combination with ammonia for SiH4 CVD and for deposition of epitaxial silicon.